Enhanced etching of Si(100) by neutral chlorine beams with kinetic energies up to 6 eV
| Author | |
| Year of Publication |
1992
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| Date Published |
Jan-09-1992
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| Journal Title |
Journal of Vacuum Science \& Technology B: Microelectronics and Nanometer Structures
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| Volume |
10
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| Start Page or Article ID (correct) |
2217
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| ISSN Number |
0734211X
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| DOI | |
| Download citation | |
| JILA PI | |
Journal Article
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| Publication Status |