Facebook Twitter Instagram YouTube

Quantitative tabletop coherent diffraction imaging microscope for EUV lithography mask inspection

TitleQuantitative tabletop coherent diffraction imaging microscope for EUV lithography mask inspection
Publication TypeConference Paper
Year of Publication2014
AuthorsZhang, B, Adams, DE, Seaberg, MD, Gardner, DF, Shanblatt, ER, Kapteyn, HC, Murnane, MM
EditorCain, JP, Sanchez, MI
Conference NameSPIE Proceedings: SPIE Advanced LithographyMetrology, Inspection, and Process Control for Microlithography XXVIII
PublisherSPIE
Conference LocationSan Jose, California, USA
URLhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?doi=10.1117/12.2046526
DOI10.1117/12.2046526

JILA follows the six University nodes' policies for ensuring harassment-free environments. For more detailed information regarding the University of Colorado policies, please read the Discrimination and Harassment Policy and Procedures.