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Ion-enhanced etching of Si(100) with molecular chlorine: Reaction mechanisms and product yields

TitleIon-enhanced etching of Si(100) with molecular chlorine: Reaction mechanisms and product yields
Publication TypeJournal Article
Year of Publication1999
AuthorsGoodman, RS, Materer, N, Leone, SR
JournalJournal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Volume17
Issue6
Pagination3340
Date PublishedJan-01-1999
ISSN07342101
DOI10.1116/1.582063
Short TitleJ. Vac. Sci. Technol. A