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A critical evaluation of low-energy electron impact cross sections for plasma processing modeling. II: Cl4, SiH4, and CH4

TitleA critical evaluation of low-energy electron impact cross sections for plasma processing modeling. II: Cl4, SiH4, and CH4
Publication TypeJournal Article
Year of Publication1992
AuthorsMorgan, WL
JournalPlasma Chemistry and Plasma Processing
Volume12
Issue4
Pagination477 - 493
Date PublishedJan-12-1992
ISSN0272-4324
URLhttp://link.springer.com/10.1007/BF01447255
DOI10.1007/BF01447255
Short TitlePlasma Chem Plasma Process

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