TY - JOUR
AU - John Doyle
AU - R. Robertson
AU - G.-H. Lin
AU - M. He
AU - Alan Gallagher
BT - Journal of Applied Physics
DA - Jan-01-1988
DO - 10.1063/1.341539
PY - 1988
EP - 3215
T2 - Journal of Applied Physics
TI - Production of high-quality amorphous silicon films by evaporative silane surface decomposition
VL - 64
SN - 00218979
ER -